The year-long Studiolab "Memory for the Future" (M4F) will create spaces and practices of humanities education, practical public history, and collaboration in the spirit of "multidirectional memory." This concept tries to address the interlinked histories and legacies of the Holocaust, slavery, apartheid, and colonialism and create opportunities for dialogue between communities impacted by and implicated in these forms of violence. Our principal aims are to explore, enrich, and sustain the global and local focus of "reparative memorial practices" in St. Louis. Focusing on commemorative efforts through public memorials, monuments and especially museums, M4F will engage survivors, activists, institutional leaders, and scholars (students and faculty) in the development of educational materials, artistic representations, exhibitions, and other approaches to bringing the past into the present. We strive to support the efforts of local and regional initiatives and venues to end racism, antisemitism, and homophobia and their related violence through innovative and inclusive memory work.
Alongside classroom-based instruction focusing on discussing scholarship and acquiring practical, curatorial, and pedagogical skills, students will work with area institutions and initiatives to apply their study of multidirectional memory. This practicum is an integral part of the course and requires students to leave campus and regularly work with one of our partners (The Griot Museum of Black History, George B. Vashon Museum, St. Louis Kaplan Feldman Holocaust Museum, The Mildred Lane Kemper Art Museum, Reparative Justice Coalition of St. Louis, St. Louis Community Remembrance Project). Participants of the Studiolab are expected to attend regular weekly meetings and engage in self-directed and collaborative project work. We are also preparing study trips to regional sites of memory and education.
The M4F Studiolab will convene at the Lewis Collaborative, a living-learning-commerci
Course Attributes: BU Hum; AS HUM; FA HUM; AR HUM; AS SC; FA CPSC; EN H